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Influence of Magnetic Field on the Reaction Mechanisms ofPlasma-Assisted Atomic Layer Deposition of
  • 期刊名称：Surface & Coating Technology
  • 时间：2013.7.9
  • 页码：s55-s60
  • 相关项目：磁场辅助等离子体增强原子层沉积技术中的物理问题研究
作者： Xingcun Li, Wenwen Lei, Qiao Zhao, Qiang Chen|
同期刊论文项目
磁场辅助等离子体增强原子层沉积技术中的物理问题研究
期刊论文 45 会议论文 24
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