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Surface engineering of synthetic nanopores by atomic layer deposition and their applications
  • ISSN号：2095-025X
  • 期刊名称：《材料科学前沿：英文版》
  • 时间：0
  • 分类：O242.23[理学—计算数学;理学—数学] TN305[电子电信—物理电子学]
  • 作者机构：[1]State Key Laboratory of Nuclear Physics and Technology, Peking University, Beijing 100871, China, [2]Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China
  • 相关基金：This work was financially supported by the Ministry of Science and Technology of China （Grant No. 2010CB832904）, NSAF （Grant No. U1230111）, and the National Natural Science Foundation of China （NSFC; Grant Nos. 91226202, 11175024 and 11375031）.
作者： Ce-Ming WANG[1], De-Lin KONG[2], Qiang CHEN[2], Jian-Ming XUE[1]
关键词： 原子层沉积, 应用程序, 表面工程, 纳米孔, 合成, 小生境技术, 单分子检测, ALD, synthetic nanopore, atomic layer deposition （ALD）, surface engineering
中文摘要：

在过去的十年， nanopores 为各种各样的潜在的应用程序广泛地被开发了，并且他们的性能极大地取决于 nanopores 的表面性质。原子层免职(ALD ) 是为扔薄电影的一种新技术，它很快从一种壁龛技术被开发了到一个确定的方法。ALD 电影能保角地甚至在 nanoscale 在限制区域盖住表面，因此，是一个强大的工具修改合成 nanopores 并且也的表面制作复杂 nanopores 被证明。这评论在 nanopore 合成和 ALD 基本知识上给简短介绍，然后集中于由 ALD 和他们的应用程序处理的合成 nanopores 的各种各样的方面，包括单个分子的察觉到， nanofluidic 设备， nanostructure 制造和另外的应用程序。

英文摘要：

In the past decade, nanopores have been developed extensively for various potential applications, and their performance greatly depends on the surface properties of the nanopores. Atomic layer deposition （ALD） is a new technology for depositing thin films, which has been rapidly developed from a niche technology to an established method. ALD films can cover the surface in confined regions even in nanoscale conformally, thus it is proved to be a powerful tool to modify the surface of the synthetic nanopores and also to fabricate complex nanopores. This review gives a brief introduction on nanopore synthesis and ALD fundamental knowledge, and then focuses on the various aspects of synthetic nanopores processing by ALD and their applications, including single-molecule sensing, nanofiuidic devices, nanostructure fabrication and other applications.

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期刊信息
  • 《材料科学前沿：英文版》
  • 主管单位:中华人民共和国教育部
  • 主办单位:高等教育出版社
  • 主编：
  • 地址：北京市朝阳区惠新东街4号富盛大厦15层
  • 邮编：100029
  • 邮箱：
  • 电话：010-58556485
  • 国际标准刊号：ISSN：2095-025X
  • 国内统一刊号：ISSN：11-5985/TB
  • 邮发代号:80-974
  • 获奖情况:
  • 国内外数据库收录:
  • 俄罗斯文摘杂志,荷兰文摘与引文数据库,美国科学引文索引（扩展库）
  • 被引量:7