以In(NO3)3.·4.5H2O为主要原料,用乙酰丙酮作溶剂,掺加SnCl4·5H2O(铟锡物质的量比为10∶1)制得溶胶,以石英玻璃为基体用提拉法制得ITO膜,与已有制备方法相比,试样每次提拉后都经过500℃的退火处理,循环5次。利用表面轮廓仪、原子力显微镜、X射线衍射仪、紫外-可见分光光度计和四探针测试仪对所制样品的厚度、形貌结构和光电性能进行测试表征。实验结果表明,制备的ITO膜导电性能好,在可见光范围内透光率高,电阻率约为5.625×10-3Ω·cm,透光率为90%~95%。
The ITO film was tirepared using In(NO3)3 ·4.5H2Oas the primary material and acetylacetone as the solvent, adding SnCl4 ·5H2O with the tool ratio In:Sn was 10:1, using quartz glasses as the substrates. comparing with the existing techniques, the samples in this paper were annealed at 500 ℃after each dipcoating, cycling for 5 times. The samples' thickness, morphology structure and performance of conductive and transparent were tested by surface profile ceremony (SPC), atomic force spectrometry (AFM), X-ray diffraction (XRD), UV-Vis spectrophotometer and four-point-probe ceremony. The experimental results show that the ITO films prepared by this method havegood conductivity and high transmittance in the range of visible light with a resistivity of 5.625 × 10-3 ·Ω cm and a transmittance of 90% - 95%.