InGaN/GaN MQW 结构被 MOCVD 种。InGaN/GaN MQW 的光、结构的性质上的生长打断时间的效果被调查。试验性的结果证明生长打断能改进接口质量,增加光致发光(PL ) 和 electroluminescence (EL ) 的紧张;但是如果打断时间太长,在 MQW 的作文的井厚度和一般水准减少了,并且 EL 紧张也由于差的接口质量减少了,杂质源于生长打断。CLC 数字 TN305 这个工作被中国(资助号码 60506012 ) 的国家自然科学基础支持,北京教育委员会发现了(没有。KZ200510005003 )
InGaN/GaN MQWs structures were grown by MOCVD. The effects of the growth interruption time on the optical and structural properties of InGaN/GaN MQWs were investigated. The experimental results show that the growth interruption can improve the interface quality, increase the intensity of photoluminescence (PL) and electroluminescence (EL); but if the interruption time was too long, the well thickness and the average In composition of MQWs decreased, and the EL intensity also decreased due to poor interface quality and impurities derived from growth interruption.