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Structure and chemical states of highly eptiaxial CeO2(001) films grown on SrTiO3 substrate by laser
Physical understanding of different drain-induced-barrier-lowering variations in high-k/metal gate n
Resistive switching characteristics of Dy2O3 film with a Pt nanocrystal embedding layer formed by pu
HfxZr1-xO2 Films Chemical Vapor Deposited From A Single Source Precursor of Anhydrous HfxZr1-x(NO3)4
Atomic configuration of the interface between epitaxial Gd doped HfO2 high k thin films and Ge (001)
Effects of rapid thermal annealing on structure and electrical properties of Gd-doped HfO2 high k fi
Hetero-epitaxial growth of the cubic single crystalline HfO(2) film as high k materials by pulsed la
Fabrication and Characterization of La-doped HfO2 Gate Dielectrics by Metalorganic Chemical Vapor De
Impact of Al/Hf ratio on electrical properties and band alignments of atomic-layer-deposited HfO2/Al
Effect of chemical surface treatments on interfacial and electrical characteristics of atomic-layer-
Electric Dipole at High-k/SiO2 Interface and Physical Origin by Dielectric Contact Induced Gap State
HfO2/Al2O3/Ge Gate Stacks with Small Capacitance Equivalent Thickness and Low Interface State Densit
Comparison of the interfacial and electrical properties of HfAlO films on Ge with S and GeO2 passiva
Effect of surface treatments on interfacial characteristics and band alignments of atomic-layer-depo
The enhancement of unipolar resistive switching behavior via an amorphous TiOx layer formation in Dy
Band structure and electronic characteristics of cubic La2O3 gate dielectrics epitaxially grown on I
Epitaxial growth and characterization of Gd2O3-doped HfO2 film on Ge (001) substrates with zero inte
Improved interfacial and electrical properties of atomic layer deposition HfO2 films on Ge with La2O
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