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HfxZr1-xO2 Films Chemical Vapor Deposited From A Single Source Precursor of Anhydrous HfxZr1-x(NO3)4
  • 期刊名称：Journal of Crystal Growth
  • 时间：2012
  • 页码：12-16
  • 相关项目：铪基稀土金属多元氧化物高K栅介质的基础研究
作者： Wenqi Zhang, Liuying Huang, Aidong Li,|Di Wu|
同期刊论文项目
铪基稀土金属多元氧化物高K栅介质的基础研究
期刊论文 58 会议论文 5 专利 11
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