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The enhancement of unipolar resistive switching behavior via an amorphous TiOx layer formation in Dy
ISSN号:0038-1101
期刊名称:Solid-State Electronics
时间:2013.1.1
页码:12-16
相关项目:铪基稀土金属多元氧化物高K栅介质的基础研究
作者:
Hongbin Zhao, Hailing Tu, Feng Wei, Xinqiang Zhang|
同期刊论文项目
铪基稀土金属多元氧化物高K栅介质的基础研究
期刊论文 58
会议论文 5
专利 11
同项目期刊论文
高真空脉冲激光沉积CeO_2(111)/Si(111)薄膜的结构与形貌研究
Fabrication and properties of Gd2O3-doped HfO2 high k film by Co-sputtering
Structure and chemical states of highly eptiaxial CeO2(001) films grown on SrTiO3 substrate by laser
Interfacial and electrical properties of atomic-layer-deposited ZrO2 with Gd2O3 passivation layer on
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A possible origin of core-level shifts in SiO2/Si stacks
Physical understanding of different drain-induced-barrier-lowering variations in high-k/metal gate n
高真空脉冲激光沉积CeO2 (111)/Si(111)薄膜的结构与形貌研究
低压化学气相沉积生长双层石墨烯及其电输运特性研究
核-壳和中空多面体二氧化钛制备、表征及光催化
Effects of NH3 annealing on interface and electrical properties of Gd-doped HfO2/Si stack
Resistive switching characteristics of Dy2O3 film with a Pt nanocrystal embedding layer formed by pu
HfxZr1-xO2 Films Chemical Vapor Deposited From A Single Source Precursor of Anhydrous HfxZr1-x(NO3)4
CeO_2掺杂对HfO_2栅介质电学特性的影响
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非易失性阻变存储器研究进展
非晶La_2O_3薄膜的阻变存储性能研究
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Effects of rapid thermal annealing on structure and electrical properties of Gd-doped HfO2 high k fi
Electrical characteristics of MOS capacitor using amorphous Gd2O3-doped HfO2 insulator
Hetero-epitaxial growth of the cubic single crystalline HfO(2) film as high k materials by pulsed la
Band structure and electrical properties of Gd-doped HfO2 high k gate dielectric
Band alignment of TiN/HfO2 interface of TiN/HfO2/SiO2/Si stack
Band alignment of HfO2 on SiO2/Si structure
First-Principles Study on Electronic Structure of Gd-Doped HfO2 High k Gate Dielectrics
Epitaxial growth and electrical properties of ultrathin La2Hf2O7 high-k gate dielectric films
Interfacial study and band alignment of ultrathin La2Hf2O7 films on GaAs substrates
Fabrication and Characterization of La-doped HfO2 Gate Dielectrics by Metalorganic Chemical Vapor De
Impact of Al/Hf ratio on electrical properties and band alignments of atomic-layer-deposited HfO2/Al
Chemical Vapor Deposited From A Single Source Precursor of Anhydrous HfxZr1-x(NO3)4
Magnetic Properties of FePt Nanoparticle Assembly Embedded in Atomic-Layer-Deposited Al2O3
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HfO2/Al2O3/Ge Gate Stacks with Small Capacitance Equivalent Thickness and Low Interface State Densit
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Photo-degradation of methylene blue using Ta-doped ZnO nanoparticle
Effect of surface treatments on interfacial characteristics and band alignments of atomic-layer-depo
Resistive switching behavior of highly epitaxial CeO2 thin film for memory application
Band structure and electronic characteristics of cubic La2O3 gate dielectrics epitaxially grown on I
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Effect of low temperature annealing on the electrical properties of an MOS capacitor with a HfO2 dielectric and a TiN metal gate
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Physical origin investigation of the flatband voltage roll off for metal-oxide-semiconductor device with high-k/metal gate structure