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Improved interfacial and electrical properties of atomic layer deposition HfO2 films on Ge with La2O
  • ISSN号：0169-4332
  • 期刊名称：Applied Surface Science
  • 时间：2013
  • 页码：783-786
  • 相关项目：铪基稀土金属多元氧化物高K栅介质的基础研究
作者： Xue-Fei Li, Xiao-Jie Liu, Yan-Qiang Cao, Ai-Dong|
同期刊论文项目
铪基稀土金属多元氧化物高K栅介质的基础研究
期刊论文 58 会议论文 5 专利 11
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