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Hetero-epitaxial growth of the cubic single crystalline HfO(2) film as high k materials by pulsed la
  • ISSN号：0022-0248
  • 期刊名称：Journal of Crystal Growth
  • 时间：2010.10.10
  • 页码：2928-2930
  • 相关项目：铪基稀土金属多元氧化物高K栅介质的基础研究
作者： Zhang, Xinqiang|Tu, Hailing|Wang, Xiaona|Xiong, Yuhua|Yang, Mengmeng|Wang, Lei|Du, Jun|
同期刊论文项目
铪基稀土金属多元氧化物高K栅介质的基础研究
期刊论文 58 会议论文 5 专利 11
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