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HfO2/Al2O3/Ge Gate Stacks with Small Capacitance Equivalent Thickness and Low Interface State Densit
  • 期刊名称：ECS Solid State Letters
  • 时间：2012
  • 页码：10-12
  • 相关项目：铪基稀土金属多元氧化物高K栅介质的基础研究
作者： Xue-Fei Li, Yan-Qiang Cao, Ai-Dong Li, Hui Li, and|
同期刊论文项目
铪基稀土金属多元氧化物高K栅介质的基础研究
期刊论文 58 会议论文 5 专利 11
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