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Al_2O_3界面钝化与热处理对Gd_2O_3-HfO_2高k薄膜电性能影响
  • ISSN号：0258-7076
  • 期刊名称：稀有金属
  • 时间：2012
  • 页码：415-418
  • 相关项目：铪基稀土金属多元氧化物高K栅介质的基础研究
作者： 郭亿文|张心强|熊玉华|杜军|杨萌萌|赵鸿滨|
同期刊论文项目
铪基稀土金属多元氧化物高K栅介质的基础研究
期刊论文 58 会议论文 5 专利 11
同项目期刊论文
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Fabrication and properties of Gd2O3-doped HfO2 high k film by Co-sputtering
Structure and chemical states of highly eptiaxial CeO2(001) films grown on SrTiO3 substrate by laser
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非易失性阻变存储器研究进展
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期刊信息
  • 《稀有金属》
  • 中国科技核心期刊
  • 主管单位:中国科学技术协会
  • 主办单位:北京有色金属研究总院
  • 主编：屠海令
  • 地址：北京新街口外大街2号
  • 邮编：100088
  • 邮箱：xxsf@grinm.com
  • 电话：010-82241917 62014832
  • 国际标准刊号：ISSN：0258-7076
  • 国内统一刊号：ISSN：11-2111/TF
  • 邮发代号:82-167
  • 获奖情况:
  • 中文核心期刊,冶金工业类核心期刊,中国科技论文统计源期刊
  • 国内外数据库收录:
  • 俄罗斯文摘杂志,美国化学文摘（网络版）,荷兰文摘与引文数据库,美国工程索引,美国剑桥科学文摘,日本日本科学技术振兴机构数据库,中国中国科技核心期刊,中国北大核心期刊（2004版）,中国北大核心期刊（2008版）,中国北大核心期刊（2011版）,中国北大核心期刊（2014版）,中国北大核心期刊（2000版）
  • 被引量:13688