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中文摘要：
针对三维曝光图形的结构特点,结合自行设计的图形发生器,提出了电子束重复增量扫描方式及曝光剂量与刻蚀深度关系和灵敏度的计算方法.根据计算得到的剂量关系,按照重复增量扫描方式,在SDS-3电子束曝光机上进行了曝光实验,显影后得到了轮廓清晰的梯锥和圆锥的三维结构.因此,重复增量扫描方式可以用于三维结构的加工,并且关于曝光剂量与刻蚀深度关系和灵敏度的计算可以为其提供符合实际曝光的参数.
英文摘要：
Overlapped increment scanning in electron beam lithography and the calculation methods for the exposure doses and the etching depth and sensitivity are presented for the structural characteristics of three-dimensional patterns as well as the self-devised pattern generator of an e-beam lithography system. Based on the calculated dose relations according to the scanning mode,the exposure experiments are conducted in an SDS-3 e-beam lithography system. After the development, the distinct three-dimensional structures of the conic of trapezoid 1 and the conic are obtained. Overlapped increment scanning therefore can be used for three-dimensional fabrication, and the calculation of the relations between exposure doses and the etching depth and sensitivity can provide the practical parameters for it.
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