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HfO2-TiO2 Ultra-Thin Gate Dielectric by Sputtering Process
  • ISSN号：0015-0193
  • 期刊名称：Ferroelectrics
  • 时间：2011.6.6
  • 页码：129-136
  • 相关项目：纳米制造中的计量溯源与测试理论研究
作者： G. X. Li, X. F. Chen, W. Ren, et al|
同期刊论文项目
纳米制造中的计量溯源与测试理论研究
期刊论文 90 会议论文 38 著作 1
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