欢迎您！东篱公司
退出
-
申报数据库
-
立项数据库
-
成果数据库
-
项目获奖数据库
中文摘要：
采用射频磁控溅射法在（001）SrTiO3基片上制备了La0．5Sr0．5CoO3薄膜，研究了沉积温度对La0．5Sr0．5CoO3薄膜微结构和导电性能的影响。结果表明：沉积温度低于400℃时，薄膜以非晶状态存在，未发生外延生长，沉积温度为550℃和650℃时，薄膜在基片上实现了外延生长；随着沉积温度的升高薄膜表面粗糙度呈现规律性的变化；薄膜的电阻率随沉积温度的升高单调下降，650℃沉积薄膜的电阻率最小为1．63μΩ·cm。
英文摘要：
La0.5Sr0. 5 CoO3 films were deposited on （001） SrTiO3 substrates at different temperatures using radio frequency magnetron sputtering method, and the effect of deposition temperatures on microstructure and conduction properties of the films were studied. The results show that when the deposition temperature was lower than 400 ℃, the prepared La0. 5 St0. 5 CoO3 films existed in amorphous state and there was no epitaxial growth. However, epitaxial growth of La0.5Sr0. 5CoO3 films on SrTiO3 substrates happened when the deposition temperature were 550℃ and 650 ℃. The surface roughness of the deposited films changed regularly with the increase of deposition temperatures. The resistivity of La0.5 Sr0.5 CoO3 films decreased monotonically with the increase of deposition temperature, and film deposited at 650 ℃ had the lowest resistivity of 163μΩ ·cm.
同期刊论文项目
同项目期刊论文
期刊信息
位置：