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中文摘要：
基于红外光在半导体材料中的透射特性,将白光扫描干涉方法从可见光波段推广到红外光波段。设计研制了Linnik结构红外光干涉系统,对具有三层台阶结构的微器件进行了无损三维形貌测试。实验结果表明,采用红外光对半导体材料微纳结构透射后的反射干涉技术,可以准确实现微纳结构内部三维形貌测量。可实现百nm量级台阶高度的准确透射测试,纵向测量误差控制在5%以内。该方法可广泛应用于半导体微纳器件结构测量技术领域,实现半导体器件封装后的内部形貌测试、键合界面质量评估以及在线工艺检测等。
英文摘要：
White-light scanning interferometry is extended from visible-light region to infrared-light region according to the characteristic of transmission to semiconductor materials.Infrared-light interference system is designed based on Linnik-type interferometric microscope.Micro structure with three steps is used to accomplish the nondestructive profile measurement.Experimental results show that internal profile of micro-nano structure can be measured accurately with infrared-light reflection and interference technology after transmission.Step height in 100nm level can be measured accurately and vertical measurement error is controlled within 5%.The method has potential applications in the field of measurement for micro-nano structure,such as reconstructing internal profile of encapsulated devices,evaluating the quality of bonding interface and monitoring process online.
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