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中文摘要：
为提高a-Si/μc-Si叠层太阳电池的效率,采用射频等离子体增强化学气相沉积（RF-PECVD）技术,制备了系列n型掺磷硅氧（SiOx：H）薄膜作为中间层,研究了CO2/Si H4气体流量比、沉积功率和PH3掺杂浓度等工艺参数对材料光电特性的影响,获得了折射率、电导率和禁带宽度能够在较大范围内调控的SiOx：H薄膜。
英文摘要：
To improve the stable efficiency of a micromorph silicon tandem solar cell,series of phosphorous doped silicon oxide films were fabricated by radio frequency plasma enhanced chemical vapor deposition（RF-PECVD）.By varying the influences of process parameters,such as the CO2/SiH4 gas flow ratio,deposition power and phosphorus doping ratio,on the material optical and electrical properties are discussed.The silicon oxide films whose properties can be controlled in a wide range are obtained.
同期刊论文项目
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Influence of front electrode and back reflector electrode on the performances of microcrystalline si
Study of space voltage distribution between large-area parallel-plate electrodes for very high frequ
Study on the optical and electrical properties of plasma for the deposition of microcrystalline sili
Study of one-dimensional spatial distribution of the plasma luminous radicals during depositing sili
Modeling and experiments of high-pressure VHFSiH4/H-2 discharges for higher microcrystalline silicon
Influence of low rate p/i interface layer on the performance of high growth rate microcrystalline si
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