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中文摘要：
采用二维准平面电路模型研究了甚高频等离子体增强化学气相沉积（VHF-PECVD）大面积平行板电极间真空电势差分布.计算结果表明：随平行板电极尺寸增加和激发频率提高,电势驻波效应成为影响电极间电势差非均匀分布的重要因素.在尺寸为1.2m×0.8m的大面积平行板电极上应用40.68和60MHz两种激发频率,通过功率馈入点数量和位置优化,计算获得非均匀性分别为±2.5%和±5.5%的真空电势差分布.这些数值计算结果为大面积平行板电极在VHF-PECVD中应用提供了重要的理论指导.
英文摘要：
The two-dimensional quasi-planar circuit model is used to study the space voltage distribution between large-area parallel-plate electrodes of very high frequency plasma enhanced chemical vapor deposition（VHF-PECVD） reactor.The results show that the voltage standing wave effects become the important factor affecting non-uniform voltage distribution when the electrode dimensions and excitation frequency are increased.For a large-area parallel-plate electrode with 1.2 m by 0.8 m lateral dimension,driven respectively at frequencies of 40.68 and 60？MHz,the space voltage non-uniformity about ±2.5% and ±5.5% are obtained by optimization of the number and position of the power feeding points.These results provide important theoretical guidance for large-area parallel-plate electrodes used for VHF-PECVD.
同期刊论文项目
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Study of one-dimensional spatial distribution of the plasma luminous radicals during depositing sili
Modeling and experiments of high-pressure VHFSiH4/H-2 discharges for higher microcrystalline silicon
Influence of low rate p/i interface layer on the performance of high growth rate microcrystalline si
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