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Coupling effect of electron cyclotron resonance hydrogen plasma and dc biasing in fabricating diamon
  • 期刊名称：PHYSICS OF PLASMAS
  • 时间：0
  • 页码：123501-1-123501-7
  • 语言：英文
  • 相关项目：低气压多频等离子体与材料表面相互作用
作者： L. Cui|X. H. Wen|L. Wang|X. D. Zhu|
同期刊论文项目
低气压多频等离子体与材料表面相互作用
期刊论文 80 会议论文 8
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