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Wet thermal annealing effect on TaN/HfO2/Ge metal-oxide-semiconductor capacitors with and without a
  • 期刊名称：Chin. Phys. B
  • 时间：2012.7.13
  • 页码：117701-117701
  • 相关项目：硅基锗材料外延及其相关器件基础研究
作者： Li Cheng|Lu Chang-Bao|Tang Rui-Fan|Tang Meng-Rao|Wu Zheng|Yang Xu|Huang Wei|Lai Hong-Kai|Chen Song-Yan|
同期刊论文项目
硅基锗材料外延及其相关器件基础研究
期刊论文 141 会议论文 16
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