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Epitaxial growth and thermal stability of Ge1-xSnx alloys on Ge-buffered Si(001) substrates
  • 期刊名称：Journal of Crystal Growth
  • 时间：2011
  • 页码：43-46
  • 相关项目：硅基锗材料外延及其相关器件基础研究
作者： S.J. Su, W. Wang|B.W. Cheng|G.Z. Zhang, W.X. Hu, C.L. Xue, Y.H. Zuo, Q.M.Wang |
同期刊论文项目
硅基锗材料外延及其相关器件基础研究
期刊论文 141 会议论文 16
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